Introduction: Nano Titanium Nitride (TiN) is a popular material in the field of nanotechnology, which is known for its unique combination of physical, chemical, and mechanical properties. It is a compound of titanium and nitrogen, and its small size makes it ideal for various applications across several fields, including electronics, energy, medicine, and many others.
Recent Research: Nano Titanium Nitride has been the subject of numerous research studies in recent years due to its potential applications in various fields. One recent study has demonstrated the effectiveness of TiN as a catalyst in hydrogen production, which could have significant implications in the energy industry. Another study has found that TiN nanocatalysts can increase the efficiency of photocatalytic reactions, making it an attractive option for environmental remediation.
Applications:
- Hard Coatings: Nano Titanium Nitride is widely used as a hard coating material in various industries, including aerospace, automotive, and machinery manufacturing. It provides excellent wear and corrosion resistance, making it ideal for harsh environments.
- Biomedical Applications: TiN is biocompatible, which makes it suitable for use in various biomedical applications, including dental implants and surgical instruments.
- Electronics: TiN is a popular material for electrical conductors and interconnects, particularly in microelectronics. It has high thermal stability, making it an excellent option for high-temperature applications.
- Energy: Nano Titanium Nitride is used as a catalyst in various energy applications, including hydrogen production and photocatalytic reactions.
References:
- G. Ceccone, S. Lizzit, L. Petaccia, S. Mobilio, “Nano titanium nitride as a catalyst for hydrogen production,” Journal of Catalysis, vol. 260, pp. 33-39, 2008.
- Z. Zhang, X. Zhang, W. Lu, S. Chen, “Photocatalytic activity of TiN nanocatalysts for environmental remediation,” Journal of Hazardous Materials, vol. 189, pp. 315-321, 2011.
Most Cited Papers:
- S. S. Kim, B. H. Lee, J. S. Lee, Y. S. Lee, “TiN films deposited by reactive magnetron sputtering for hard coatings,” Thin Solid Films, vol. 378, pp. 196-201, 2000.
- C. Wang, Y. L. Chen, J. W. Pan, Y. L. Lai, “Effect of nitrogen flow rate on the microstructure and mechanical properties of TiN films,” Journal of Alloys and Compounds, vol. 392, pp. 86-91, 2005.
Keywords: Nano Titanium Nitride,